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Method for Creating Photonic Band Gap Materials

Ames Laboratory

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Technology Marketing SummaryInnovative microstructures that can direct light in a manner similar to the way semiconductors can influence electrons can be produced by creating what is termed a photonic band gap. These microstructures have the potential to change the way optoelectronic devices, such as photodiodes, LEDs, and integrated optical circuit elements, are designed and used. ISU researchers have developed a method for creating photonic band gap materials that is economical and does not require the use of specialized equipment or a clean room. This innovation may facilitate the development of novel optoelectronic devices.DescriptionMicrostructures that produce photonic band gaps have been produced using a layer-by-layer fabrication method, as well as by silicon processing and wafer-bonding techniques. However, these methods require specialized equipment or clean room facilities, and can also result in microstructures that may be misaligned or subject to delamination. To overcome these issues, ISU and Ames Laboratory researchers have developed a method for producing photonic band gap materials that uses microtransfer molding. The microtransfer molding technique is a method whereby a layer is accurately deposited and then transferred onto the lattice structure of the photonic crystal.BenefitsThe method for creating photonic band gap materials is:
  • Economical (uses inexpensive starting materials)
  • Simple (does not require specialized equipment or clean room facility)
  • Flexible (defects can be introduced using different relief patterns)
  • Reliable (process reduces misalignment and delamination flaws).
Applications and IndustriesOptoelectronics, Color Displays, IR DisguiseTechnology Status
Technology IDDevelopment StageAvailabilityPublishedLast Updated
2788Development - Patent(s) applied forAvailable12/07/201012/28/2010

Contact AMES About This Technology

To: Stacy Joiner<joiner@ameslab.gov>