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Process to form mesostructured films

United States Patent

January 12, 1999
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
This invention comprises a method to form a family of supported films film with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film deposition. Optically transparent, 100-500-nm thick films exhibiting a unique range of microstructures and uni-modal pore sizes are formed in seconds in a continuous coating operation. Applications of these films include sensors, membranes, low dielectric constant interlayers, anti-reflective coatings, and optical hosts.
Brinker; C. Jeffrey (Albuquerque, NM), Anderson; Mark T. (Woodbury, MN), Ganguli; Rahul (Camarillo, CA), Lu; Yunfeng (Albuquerque, NM)
Sandia Corporation (Albuquerque, NM)
08/ 937,407
September 25, 1997
This invention was made with Government support under Contract No. DE-AC04-94AL85000 awarded by the Department of Energy. The Government has certain rights in the invention.