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Surface treatment of magnetic recording heads

United States Patent

November 17, 1998
View the Complete Patent at the US Patent & Trademark Office
Lawrence Berkeley National Laboratory - Visit the Technology Transfer and Intellectual Property Management Department Website
Surface modification of magnetic recording heads using plasma immersion ion implantation and deposition is disclosed. This method may be carried out using a vacuum arc deposition system with a metallic or carbon cathode. By operating a plasma gun in a long-pulse mode and biasing the substrate holder with short pulses of a high negative voltage, direct ion implantation, recoil implantation, and surface deposition are combined to modify the near-surface regions of the head or substrate in processing times which may be less than 5 min. The modified regions are atomically mixed into the substrate. This surface modification improves the surface smoothness and hardness and enhances the tribological characteristics under conditions of contact-start-stop and continuous sliding. These results are obtained while maintaining original tolerances.
Komvopoulos; Kyriakos (Orinda, CA), Brown; Ian G. (Berkeley, CA), Wei; Bo (Albany, CA), Anders; Simone (Albany, CA), Anders; Andre (Albany, CA), Bhatia; C. Singh (Morgan Hill, CA)
The Regents of the University of California (Oakland, CA)
08/ 794,672
February 3, 1997
This invention was made with government support under Grant Nos. MSS-8996309 and DE-AC03-76SF-00098 awarded by the National Science Foundation and the U.S. Department of Energy. The Government has certain rights in this invention.