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Nanocrystal thin film fabrication methods and apparatus

United States Patent

January 9, 2018
View the Complete Patent at the US Patent & Trademark Office
Nanocrystal thin film devices and methods for fabricating nanocrystal thin film devices are disclosed. The nanocrystal thin films are diffused with a dopant such as Indium, Potassium, Tin, etc. to reduce surface states. The thin film devices may be exposed to air during a portion of the fabrication. This enables fabrication of nanocrystal-based devices using a wider range of techniques such as photolithography and photolithographic patterning in an air environment.
Kagan; Cherie R. (Bala Cynwyd, PA), Kim; David K. (Lincoln, MA), Choi; Ji-Hyuk (Philadelphia, PA), Lai; Yuming (Philadelphia, PA)
The Trustees Of The University Of Pennsylvania (Philadelphia, PA)
14/ 761,799
January 17, 2014
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH Aspects of this invention were made with government support under one or more of: National Science Foundation MRSEC Program under Award Number DMR-1120901, National Science Foundation CBET Program under Award CBET-0854226, and the U.S. Department of Energy Office of Basic Energy Sciences, Division of Materials Science and Engineering, under Award No. DE-SC0002158. The government has rights in this invention.