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Rapid self-assembly of block copolymers to photonic crystals

United States Patent

July 5, 2016
View the Complete Patent at the US Patent & Trademark Office
The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.
Xia; Yan (Quincy, MA), Sveinbjornsson; Benjamin R (Pasadena, CA), Grubbs; Robert H (South Pasadena, CA), Weitekamp; Raymond (Glendale, CA), Miyake; Garret M (Pasadena, CA), Atwater; Harry A (South Pasadena, CA), Piunova; Victoria (Altadena, CA), Daeffler; Christopher Scot (Pasadena, CA), Hong; Sung Woo (Seoul, KR), Gu; Weiyin (Amherst, MA), Russell; Thomas P. (Amherst, MA)
13/ 800,646
March 13, 2013
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT This invention was made with government support under DE-FG02-05ER46218 awarded by the Department of Energy, support under GM031332 awarded by the National Institutes of Health, and support under CHE1048404 awarded by the National Science Foundation. The government has certain rights in the invention.