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Methods for globally treating silica optics to reduce optical damage

United States Patent

November 20, 2012
View the Complete Patent at the US Patent & Trademark Office
Lawrence Livermore National Laboratory - Visit the Industrial Partnerships Office Website
A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.
Miller; Philip Edward (Livermore, CA), Suratwala; Tayyab Ishaq (Pleasanton, CA), Bude; Jeffrey Devin (Danville, CA), Shen; Nan (Fremont, CA), Steele; William Augustus (Tracy, CA), Laurence; Ted Alfred (Livermore, CA), Feit; Michael Dennis (Livermore, CA), Wong; Lana Louie (Pleasanton, CA)
Lawrence Livermore National Security, LLC (Livermore, CA)
12/ 572,220
October 1, 2009
STATEMENT AS TO RIGHTS TO INVENTIONS MADE UNDER FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT The United States Government has rights in this invention pursuant to Contract No. DE-AC52-07NA27344 between the U.S. Department of Energy and Lawrence Livermore National Security, LLC, for the operation of Lawrence Livermore National Laboratory.