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One-step synthesis and patterning of aligned polymer nanowires on a substrate

United States Patent

November 8, 2011
View the Complete Patent at the US Patent & Trademark Office
In a method of making a polymer structure on a substrate a layer of a first polymer, having a horizontal top surface, is applied to a surface of the substrate. An area of the top surface of the polymer is manipulated to create an uneven feature that is plasma etched to remove a first portion from the layer of the first polymer thereby leaving the polymer structure extending therefrom. A light emitting structure includes a conductive substrate from which an elongated nanostructure of a first polymer extends. A second polymer coating is disposed about the nanostructure and includes a second polymer, which includes a material such that a band gap exists between the second polymer coating and the elongated nanostructure. A conductive material coats the second polymer coating. The light emitting structure emits light when a voltage is applied between the conductive substrate and the conductive coating.
Wang; Zhong L. (Marietta, GA), Wang; Xudong (Atlanta, GA), Morber; Jenny R. (Atlanta, GA), Liu; Jin (Danbury, CT)
Georgia Tech Research Corporation (Atlanta, GA)
12/ 492,333
June 26, 2009
STATEMENT OF GOVERNMENT INTEREST This invention was made with support from the U.S. government under grant number DE-FG02-07ER46394, awarded by the Department of Energy. The government may have certain rights in the invention.