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Charge-free method of forming nanostructures on a substrate

United States Patent

July 20, 2010
View the Complete Patent at the US Patent & Trademark Office
Los Alamos National Laboratory - Visit the Technology Transfer Division Website
A charge-free method of forming a nanostructure at low temperatures on a substrate. A substrate that is reactive with one of atomic oxygen and nitrogen is provided. A flux of neutral atoms of least one of oxygen and nitrogen is generated within a laser-sustained-discharge plasma source and a collimated beam of energetic neutral atoms and molecules is directed from the plasma source onto a surface of the substrate to form the nanostructure. The energetic neutral atoms and molecules in the beam have an average kinetic energy in a range from about 1 eV to about 5 eV.
Hoffbauer; Mark (Los Alamos, NM), Akhadov; Elshan (Los Alamos, NM)
Los Alamos National Security, LLC (Los Alamos, NM)
11/ 603,516
November 21, 2006
STATEMENT REGARDING FEDERAL RIGHTS This invention was made with government support under Contract No. DE-AC 52-06 NA 25396 awarded by the U.S. Department of Energy. The government has certain rights in the invention.