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Decal transfer lithography

United States Patent

February 16, 2010
View the Complete Patent at the US Patent & Trademark Office
A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.
Nuzzo; Ralph G. (Champaign, IL), Childs; William R. (Champaign, IL), Motala; Michael J. (Champaign, IL), Lee; Keon Jae (Savoy, IL)
The Board of Trustees of the University of Illinois (Urbana, IL)
10/ 965,279
October 14, 2004
FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT The subject matter of this application was in part funded by the National Science Foundation (NSF) Grant no. CHE 0097096; by the Defense Advanced Research Projects Agency (DARPA) Grant no. FA8650-04-C-7101; and by the Department of Energy (DOE) Grant no. DEFG02-91ER45439. The government may have certain rights in this invention.