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Methods of making monolayers

United States Patent

September 15, 2009
View the Complete Patent at the US Patent & Trademark Office
Pacific Northwest National Laboratory - Visit the Technology Commercialization Program Website
The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.
Alford; Kentin L. (Pasco, WA), Simmons; Kevin L. (Kennewick, WA), Samuels; William D. (Richland, WA), Zemanian; Thomas S. (Richland, WA), Liu; Jun (Albuquerque, NM), Shin; Yongsoon (Richland, WA), Fryxell; Glen E. (Kennewick, WA)
Battelle Memorial Institute (Richland, WA)
11/ 433,315
May 11, 2006
GOVERNMENT RIGHTS This invention was made with Government support under Contract DE-AC0676RLO1830 awarded by the U.S. Department of Energy. The Government has certain rights in the invention.