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Ultra-short wavelength x-ray system

United States Patent

January 22, 2008
View the Complete Patent at the US Patent & Trademark Office
A method and apparatus to generate a beam of coherent light including x-rays or XUV by colliding a high-intensity laser pulse with an electron beam that is accelerated by a synchronized laser pulse. Applications include x-ray and EUV lithography, protein structural analysis, plasma diagnostics, x-ray diffraction, crack analysis, non-destructive testing, surface science and ultrafast science.
Umstadter; Donald (Ann Arbor, MI), He; Fei (Ann Arbor, MI), Lau; Yue-Ying (Potomac, MD)
The Regents of the University of Michigan (Ann Arbor, MI)
10/ 752,604
January 7, 2004
GOVERNMENT'S RIGHT CLAUSE This invention was made with government support provided by the Department of Energy (Grant No. DE-FG02-96ER14685) and Office of Naval Research (Grant No. N00014-01-1-0849). The government has certain rights in the invention.