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In-situ X-ray diffraction system using sources and detectors at fixed angular positions

United States Patent

June 26, 2007
View the Complete Patent at the US Patent & Trademark Office
An x-ray diffraction technique for measuring a known characteristic of a sample of a material in an in-situ state. The technique includes using an x-ray source for emitting substantially divergent x-ray radiation--with a collimating optic disposed with respect to the fixed source for producing a substantially parallel beam of x-ray radiation by receiving and redirecting the divergent paths of the divergent x-ray radiation. A first x-ray detector collects radiation diffracted from the sample; wherein the source and detector are fixed, during operation thereof, in position relative to each other and in at least one dimension relative to the sample according to a-priori knowledge about the known characteristic of the sample. A second x-ray detector may be fixed relative to the first x-ray detector according to the a-priori knowledge about the known characteristic of the sample, especially in a phase monitoring embodiment of the present invention.
Gibson; David M. (Voorheesville, NY), Gibson; Walter M. (Voorheesville, NY), Huang; Huapeng (Latham, NY)
11/ 346,699
February 3, 2006
GOVERNMENT RIGHTS STATEMENT This invention was made with Government support under Contract #: DE-FG02-99ER82918 awarded by the United States Department of Energy to X-Ray Optical Systems, Inc. The Government has certain rights in this invention.