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Dual ion beam assisted deposition of biaxially textured template layers

United States Patent

May 31, 2005
View the Complete Patent at the US Patent & Trademark Office
Los Alamos National Laboratory - Visit the Technology Transfer Division Website
The present invention is directed towards a process and apparatus for epitaxial deposition of a material, e.g., a layer of MgO, onto a substrate such as a flexible metal substrate, using dual ion beams for the ion beam assisted deposition whereby thick layers can be deposited without degradation of the desired properties by the material. The ability to deposit thicker layers without loss of properties provides a significantly broader deposition window for the process.
Groves; James R. (Los Alamos, NM), Arendt; Paul N. (Los Alamos, NM), Hammond; Robert H. (Los Altos, CA)
The Regents of the University of California (Los Alamos, NM)
10/ 208,086
July 29, 2002
STATEMENT REGARDING FEDERAL RIGHTS This invention was made with government support under Contract No. W-7405-ENG-36 awarded by the U.S. Department of Energy. The government has certain rights in the invention.