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System configured for applying multiple modifying agents to a substrate

United States Patent

November 25, 2003
View the Complete Patent at the US Patent & Trademark Office
Idaho National Laboratory - Visit the Technology Transfer and Commercialization Office Website
The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.
Propp; W. Alan (Idaho Falls, ID), Argyle; Mark D. (Idaho Falls, ID), Janikowski; Stuart K. (Idaho Falls, ID), Fox; Robert V. (Idaho Falls, ID), Toth; William J. (Idaho Falls, ID), Ginosar; Daniel M. (Idaho Falls, ID), Allen; Charles A. (Idaho Falls, ID), Miller; David L. (Idaho Falls, ID)
Bechtel BWXT Idaho, LLC (Idaho Falls, ID)
09/ 671,459
September 27, 2000
CONTRACTUAL ORIGIN OF THE INVENTION This invention was made with U.S. Government support under Contract No. DE-AC07-94ID13223, now Contract No. DE-AC07-99ID13727 awarded by the U.S. Department of Energy. The U.S. Government has certain rights in the invention.