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Chemical surface deposition of ultra-thin semiconductors

United States Patent

March 25, 2003
View the Complete Patent at the US Patent & Trademark Office
A chemical surface deposition process for forming an ultra-thin semiconducting film of Group IIB-VIA compounds onto a substrate. This process eliminates particulates formed by homogeneous reactions in bath, dramatically increases the utilization of Group IIB species, and results in the formation of a dense, adherent film for thin film solar cells. The process involves applying a pre-mixed liquid coating composition containing Group IIB and Group VIA ionic species onto a preheated substrate. Heat from the substrate causes a heterogeneous reaction between the Group IIB and VIA ionic species of the liquid coating composition, thus forming a solid reaction product film on the substrate surface.
McCandless; Brian E. (Elkton, MD), Shafarman; William N. (Wilmington, DE)
09/ 942,536
August 30, 2001
GOVERNMENT INTEREST The U.S Government has rights in this invention pursuant to Contract No. ZAK-8-17619-33 between the Department of Energy and the University of Delaware.