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Lithographic fabrication of nanoapertures

United States Patent

January 7, 2003
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
A new class of silicon-based lithographically defined nanoapertures and processes for their fabrication using conventional silicon microprocessing technology have been invented. The new ability to create and control such structures should significantly extend our ability to design and implement chemically selective devices and processes.
Fleming; James G. (Albuquerque, NM)
Sandia Corporation (Albuquerque, NM)
09/ 579,824
May 25, 2000
GOVERNMENT RIGHTS This invention was made with Government support under Contract DE-AC04-94AL85000 awarded by the U.S. Department of Energy. The Government has certain rights in the invention.