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Diffraction spectral filter for use in extreme-UV lithography condenser

United States Patent

October 22, 2002
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
A condenser system for generating a beam of radiation includes a source of radiation light that generates a continuous spectrum of radiation light; a condenser comprising one or more first optical elements for collecting radiation from the source of radiation light and for generating a beam of radiation; and a diffractive spectral filter for separating first radiation light having a particular wavelength from the continuous spectrum of radiation light. Cooling devices can be employed to remove heat generated. The condenser system can be used with a ringfield camera in projection lithography.
Sweatt; William C. (Albuquerque, NM), Tichenor; Daniel A. (Castro Valley, CA), Bernardez; Luis J. (Livermore, CA)
EUV LLC (Santa Clara, CA)
09/ 631,617
August 4, 2000
This invention was made with Government support under Contract No. DE-AC04-94AL85000 awarded by the U.S. Department of Energy to Sandia Corporation. The Government has certain rights to the invention.