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Condenser for extreme-UV lithography with discharge source

United States Patent

September 4, 2001
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
Condenser system, for use with a ringfield camera in projection lithography, employs quasi grazing-incidence collector mirrors that are coated with a suitable reflective metal such as ruthenium to collect radiation from a discharge source to minimize the effect of contaminant accumulation on the collecting mirrors.
Sweatt; William C. (Albuquerque, NM), Kubiak; Glenn D. (Livermore, CA)
EUV LLC (Santa Clara, CA)
09/ 489,163
January 21, 2000
This invention was made with Government support under Contract No. DE-AC04-94AL85000 awarded by the U.S. Department of Energy to Sandia Corporation. The Government has certain rights to the invention.