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Method for making surfactant-templated, high-porosity thin films

United States Patent

August 7, 2001
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
An evaporation-induced self-assembly method to prepare a surfactant-templated thin film by mixing a silica sol, a surfactant, and a hydrophobic polymer and then evaporating a portion of the solvent during coating onto a substrate and then heating to form a liquid-phase, thin film material with a porosity greater than approximately 50 percent. The high porosity thin films can have dielectric constants less than 2 to be suitable for applications requiring low-dielectric constants. An interstitial compound can be added to the mixture, with the interstitial compound either covalently bonded to the pores or physically entrapped within the porous structure. The selection of the interstitial compound provides a means for developing thin films for applications including membranes, sensors, low dielectric constant films, photonic materials and optical hosts.
Brinker; C. Jeffrey (Albuquerque, NM), Lu; Yunfeng (San Jose, CA), Fan; Hongyou (Albuquerque, NM)
Sandia Corporation (Albuquerque, NM)
09/ 517,689
March 2, 2000
This invention was made with Government support under Contract No. DE-DE-AC04-94AL85000 awarded by the Department of Energy. The Government has certain rights in the invention.