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Diffractive element in extreme-UV lithography condenser

United States Patent

September 12, 2000
View the Complete Patent at the US Patent & Trademark Office
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Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.
Sweatt; William C. (Albuquerque, NM), Ray-Chaudhurl; Avijit K. (Livermore, CA)
Euv, L.L.C (Livermore, CA)
09/ 130,224
August 6, 1998
The U.S. Government has a paid-up license in this invention and the right in limited circumstances to require the patent owner to license others on reasonable terms as provided for by the terms of Contract No. DE-AC04-94AL85000 awarded by the Department of Energy.