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Chemical vapor deposition of aluminum oxide

United States Patent

March 14, 2000
View the Complete Patent at the US Patent & Trademark Office
National Renewable Energy Laboratory - Visit the NREL Technology Transfer Website
An aluminum oxide film is deposited on a heated substrate by CVD from one or more alkylaluminum alkoxide compounds having composition R.sub.n Al.sub.2 (OR').sub.6-n, wherein R and R' are alkyl groups and n is in the range of 1 to 5.
Gordon; Roy (Cambridge, MA), Kramer; Keith (Cleveland, OH), Liu; Xinye (Cambridge, MA)
President and Fellows of Harvard College (Cambridge, MA)
09/ 284,526
June 11, 1999
This invention was made with government support under Subcontract Number XAN-4-13318-05 under Prime Contract Number DE-AC02-83CH10093 awarded by the Midwest Research Institute, National Renewable Energy Laboratory Division. The United States government may have certain rights in this invention.