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Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources

United States Patent

January 4, 2000
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.
Kubiak; Glenn D. (Livermore, CA), Bernardez, II; Luis J. (Tracy, CA)
EUV LLC (Santa Clara, CA)
09/ 032,224
February 27, 1998
STATEMENT OF GOVERNMENT INTEREST This invention was made with Government support under contract no. DE - AC04 - 94AL85000 awarded by the U.S. Department of Energy to Sandia Corporation. The Government has certain rights in the invention.