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Multilayer dielectric diffraction gratings

United States Patent

May 25, 1999
View the Complete Patent at the US Patent & Trademark Office
Lawrence Livermore National Laboratory - Visit the Industrial Partnerships Office Website
The design and fabrication of dielectric grating structures with high diffraction efficiency used in reflection or transmission is described. By forming a multilayer structure of alternating index dielectric materials and placing a grating structure on top of the multilayer, a diffraction grating of adjustable efficiency, and variable optical bandwidth can be obtained. Diffraction efficiency into the first order in reflection varying between 1 and 98 percent has been achieved by controlling the design of the multilayer and the depth, shape, and material comprising the grooves of the grating structure. Methods for fabricating these gratings without the use of ion etching techniques are described.
Perry; Michael D. (Livermore, CA), Britten; Jerald A. (Oakley, CA), Nguyen; Hoang T. (Livermore, CA), Boyd; Robert (Livermore, CA), Shore; Bruce W. (Livermore, CA)
The Regents of the University of California (Oakland, CA)
08/ 536,874
September 29, 1995
The United States Government has rights in this invention pursuant to Contract No. W-7405-ENG-48 between the United States Department of Energy and the University of California for the operation of Lawrence Livermore National Laboratory.