Skip to Content
Find More Like This
Return to Search

Virtual mask digital electron beam lithography

United States Patent

April 6, 1999
View the Complete Patent at the US Patent & Trademark Office
Oak Ridge National Laboratory - Visit the Partnerships Directorate Website
Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made.
Baylor; Larry R. (Farragut, TN), Thomas; Clarence E. (Knoxville, TN), Voelkl; Edgar (Oak Ridge, TN), Moore; James A. (Powell, TN), Simpson; Michael L. (Knoxville, TN), Paulus; Michael J. (Knoxville, TN)
Lockheed Martin Energy Research Corporation (Oakridge, TN)
08/ 795,003
February 5, 1997
STATEMENT AS TO RIGHTS TO INVENTIONS MADE UNDER FEDERALLY-SPONSORED RESEARCH AND DEVELOPMENT The U.S. Government has a paid-up license in this invention and the right in limited circumstances to require the patent owner to license others on reasonable terms as provided for by the terms of No. DE-AC05-96OR22464 awarded by the Department of Energy.