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Particle beam biaxial orientation of a substrate for epitaxial crystal growth

United States Patent Application

View the Complete Application at the US Patent & Trademark Office
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The invention provides a method of increasing the extent of a desired biaxial orientation of a previously formed non-single-crystal structure by contacting said structure with an oblique particle beam thereby forming in the structure a nucleating surface having increased desired biaxial orientation. The method can further include a step of epitaxially growing the crystalline formation using the nucleating surface to promote the epitaxial growth. The invention also provides a crystalline structure containing a nucleating surface formed by contacting a previously formed non-single-crystal structure with an oblique particle beam, from 0 to 10 adjacent orientation-transmitting layers, and a crystalline active layer. In this structure, the active layer is oriented in registry with the nucleating surface.
Reade, Ronald P. (Berkeley, CA), Berdahl, Paul H. (Walnut Creek, CA), Russo, Richard E. (Walnut Creek, CA)
09/ 917,321
July 27, 2001
[0001] The invention described herein arose in the course of, or under, Contract No. DE-AC03-76SF00098 between the United States Department of Energy and the University of California for the operation of the Ernest Orlando Lawrence Berkeley National Laboratory. The Government may have rights to the invention.