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United States Patent Application

View the Complete Application at the US Patent & Trademark Office
Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.
Tuominen, Mark (Shutesbury, MA), Bal, Mustafa (Sunderland, MA), Russell, Thomas P. (Amherst, MA), Ursache, Andrei (Amherst, MA)
UNIVERSITY OF MASSACHUSETTS (One Beacon Street 26th Floor Boston ME 02108)
11/ 613,017
December 19, 2006
GOVERNMENT RIGHTS [0001] This invention was made with government support under U.S. Department of Energy Grant No. DE-FG02-96ERA45612, U.S. National Science Foundation Grant No. DMR-9809365, and U.S. National Science Foundation Grant No. CTS-9871782. The government has certain rights in this invention.