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United States Patent Application

View the Complete Application at the US Patent & Trademark Office
A protection layer is formed on a highly-reactive substantially-pure metal anode to a thickness of between 1 nm and 200 nm, inclusive, using atomic layer deposition (ALD). The ALD protection layer allows the conduction of ions of the metal of the anode therethrough but suppresses electron transport therethrough. The ALD protection layer may also be effective to inhibit passage of air and/or water therethrough. The ALD protection layer can allow more relaxed purity requirements for subsequent battery assembly, electrolyte specifications, and/or cathode gas purity. Fabrication methods for the protection layers, protected metal anodes, and systems and devices incorporating such protected metal anodes are also disclosed herein.
KOZEN, Alexander C. (College Park, MD), SCHROEDER, Marshall A. (Sykesville, MD), RUBLOFF, Gary W. (Clarksville, MD), HU, Liangbing (Hyattsville, MD), NOKED, Malakhi (Rockville, MD), LEE, Sang Bok (Clarksville, MD)
15/ 517,126
October 5, 2015
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH [0002] This invention was made with government support under DESC0001160 awarded by the Department of Energy (DOE). The government has certain rights in the invention.