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Methods For Dual-Scale Surface Texturing

United States Patent Application

View the Complete Application at the US Patent & Trademark Office
Methods for preparing a substrate surface are provided, for purposes including manufacturing a low reflectivity surface. In some aspects, the methods include providing a material comprising an etching mask on a substrate, subjecting the material to a first isotropic etching phase, and subjecting the material to a first anisotropic etching phase, thereby forming a textured surface on the material, wherein the textured surface comprises structures with dimensions in a sub-micron range.
Choi, Jeayoung (Chandler, AZ), Honsberg, Christiana (Tempe, AZ)
14/ 447,898
July 31, 2014
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH [0002] This invention was made with government support under 1041895 awarded from the National Science Foundation and the Department of Energy. The United States government has certain rights in the invention.