Skip to Content
Find More Like This
Return to Search

Manufacturing Method of Photonic Crystal

United States Patent Application

View the Complete Application at the US Patent & Trademark Office
A manufacturing method of a photonic crystal is provided. In the method, a high-refractive-index material is conformally deposited on an exposed portion of a periodic template composed of a low-refractive-index material by an atomic layer deposition process so that a difference in refractive indices or dielectric constants between the template and adjacent air becomes greater, which makes it possible to form a three-dimensional photonic crystal having a superior photonic bandgap. Herein, the three-dimensional structure may be prepared by a layer-by-layer method.
Biswas, Rana (Ames, IA), Constant, Kristen (Ames, IA), Ho, Kai-Ming (Ames, IA), Lee, Jae-Hwang (Chestnut Hill, MA), Park, In Sung (Seoul, KR), Lee, Tae l lo (Seoul, KR), Ahn, Jin Ho (Seoul, KR)
; IUCF-HYU Industry-University Cooperation Foundation, Hanyang University (Seoul IA), Iowa State University Research Foundation, Inc. (Ames)
13/ 727,304
December 26, 2012
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH AND DEVELOPMENT [0002] This invention was made in part with Government support under Grant Numbers DE-ACO2-07CH11358 awarded by the United States Department of Energy. The Government has certain rights in this invention.