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United States Patent Application

View the Complete Application at the US Patent & Trademark Office
Los Alamos National Laboratory - Visit the Technology Transfer Division Website
A process for planarizing a substrate involves applying a coating of a first solution of yttrium oxide precursor to a rough substrate surface and heating to remove solvent and convert the yttrium oxide precursor to yttrium oxide. This is repeated with the first solution and then with the second solution. A final surface roughness less than 1 nm RMS may be obtained. In addition, a process for preparing a layered structure includes solution deposition planarization of a rough substrate using different concentrations of metal oxide precursor to provide a metal oxide surface having a surface roughness, and then depositing MgO by IBAD (ion beam assisted deposition). A benefit of a better in plane MgO texture was observed for lower molarities, and when two solutions of different concentrations was employed for coating the rough substrate prior to IBAD-MgO.
Matias, Vladimir (Santa Fe, NM), Sheehan, Christopher J. (Santa Fe, NM), Ihlefeld, Jon Fredrick (Albuquerque, NM), Clem, Paul Gilbert (Albuquerque, NM)
Los Alamos National Security, LLC (Los Alamos NM)
13/ 168,093
June 24, 2011
STATEMENT REGARDING FEDERAL RIGHTS [0002] This invention was made with government support under Contract No. DE-AC52-06NA25396 awarded by the U.S. Department of Energy. The government has certain rights in the invention.