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Precision cleaning apparatus and method

United States Patent

*** EXPIRED ***
January 13, 1998
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.
Schneider; Thomas W. (Albuquerque, NM), Frye; Gregory C. (Cedar Crest, NM), Martin; Stephen J. (Albuquerque, NM)
Sandia Corporation (Albuquerque, NM)
08/ 398,276
March 3, 1995
This invention was made with Government support under Contract. No. DE-AC04-94AL85000 awarded by the U.S. Department of Energy. The Government has certain rights in the invention.