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Recovery of Mo/Si multilayer coated optical substrates

United States Patent

5,698,113
December 16, 1997
View the Complete Patent at the US Patent & Trademark Office
Lawrence Livermore National Laboratory - Visit the Industrial Partnerships Office Website
Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO.sub.2 overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.
Baker; Sherry L. (Pleasanton, CA), Vernon; Stephen P. (Pleasanton, CA), Stearns; Daniel G. (Los Altos, CA)
The Regents of the University of California (Oakland, CA)
08/ 607,055
February 22, 1996
The United States Government has rights in this invention pursuant to Contract No. W-7405-ENG-48 between the United States Department of Energy and the University of California for the operation of Lawrence Livermore National Laboratory.