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Computer-aided engineering system for design of sequence arrays and lithographic masks

United States Patent

*** EXPIRED ***
January 14, 1997
View the Complete Patent at the US Patent & Trademark Office
An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks.
Hubbell; Earl A. (Mt. View, CA), Lipshutz; Robert J. (Palo Alto, CA), Morris; Macdonald S. (San Jose, CA), Winkler; James L. (Palo Alto, CA)
Affymetrix, Inc. (Santa Clara, CA)
08/ 460,411
June 2, 1995
GOVERNMENT RIGHTS NOTICE Portions of the material in this specification arose in the course of or under contract nos. 92ER81275 (SBIR) between Affymetrix, Inc. and the Department of Energy and/or H600813-1, -2 between Affymetrix, Inc. and the National Institutes of Health.