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Optical processing furnace with quartz muffle and diffuser plate

United States Patent

5,577,157
November 19, 1996
View the Complete Patent at the US Patent & Trademark Office
National Renewable Energy Laboratory - Visit the NREL Technology Transfer Website
Optical Furnace offers improved semiconductor device processing capabilities
An optical furnace for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the wall of the muffle is also provided for controlling the source of optical energy.
Sopori; Bhushan L. (Denver, CO)
Midwest Research Institute (Kansas City, MO)
08/ 462,752
June 5, 1995
The United States Government has rights in this invention under Contract No. DE-AC02-83CH10093 between the United States Department of Energy and the National Renewable Energy Laboratory, a division of the Midwest Research Institute.