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Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

United States Patent

*** EXPIRED ***
November 19, 1996
View the Complete Patent at the US Patent & Trademark Office
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Method and apparatus for producing extreme ultra violet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10.sup.11 -10.sup.12 watts/cm.sup.2) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10-30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle.
Kublak; Glenn D. (Livermore, Alameda County, CA), Richardson; Martin C. (Orlando, Orande County, FL)
08/ 378,426
January 25, 1995
STATEMENT OF GOVERNMENT INTEREST The government has rights in this invention pursuant to contract no. DE-AC04-94AL8500 between the U.S. Department of Energy and Sandia Corporation.