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Computer-aided engineering system for design of sequence arrays and lithographic masks

United States Patent

*** EXPIRED ***
November 5, 1996
View the Complete Patent at the US Patent & Trademark Office
An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).
Hubbell; Earl A. (Mt. View, CA), Morris; MacDonald S. (San Jose, CA), Winkler; James L. (Palo Alto, CA)
Affymax Technologies N.V. (Curaco, AN)
08/ 249,188
May 24, 1994
GOVERNMENT RIGHTS NOTICE Portions of the material in this specification arose in the course of or under contract nos. 92ER81275 (SBIR) between Affymetrix, Inc. and the Department of Energy and/or H600813-1, -2 between Affymetrix, Inc. and the National Institutes of Health.