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Propenyl ether monomers for photopolymerization

United States Patent

*** EXPIRED ***
October 22, 1996
View the Complete Patent at the US Patent & Trademark Office
Propenyl ether monomers of formula V wherein n is an integer from one to six and A is selected from cyclic ethers, polyether and alkanes are disclosed. The monomers are readily polymerized in the presence of cationic photoinitiators, when exposed to actinic radiation, to form poly(propenyl ethers) that are useful for coatings, sealants, varnishes and adhesives. Compositions for preparing polymeric coatings comprising the compounds of formula V together with particular cationic photoinitiators are also disclosed, as are processes for making the monomers from allyl halides and readily available alcohols. The process involves rearranging the resulting allyl ethers to propenyl ethers.
Crivello; James V. (Clifton Park, NY)
Rensselaer Polytechnic Institute (Troy, NY)
08/ 571,200
December 12, 1995
STATEMENT OF RIGHTS UNDER FEDERALLY SPONSORED RESEARCH This invention was made with support under Department of Energy Grant No. DE-FG02-91ER12117. Accordingly, the U.S. Government may have certain rights in the invention.