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Characterization of dielectric materials

United States Patent

June 27, 2017
View the Complete Patent at the US Patent & Trademark Office
Oak Ridge National Laboratory - Visit the Partnerships Directorate Website
A system and a method for characterizing a dielectric material are provided. The system and method generally include applying an excitation signal to electrodes on opposing sides of the dielectric material to evaluate a property of the dielectric material. The method can further include measuring the capacitive impedance across the dielectric material, and determining a variation in the capacitive impedance with respect to either or both of a time domain and a frequency domain. The measured property can include pore size and surface imperfections. The method can still further include modifying a processing parameter as the dielectric material is formed in response to the detected variations in the capacitive impedance, which can correspond to a non-uniformity in the dielectric material.
King; Danny J. (Ann Arbor, MI), Babinec; Susan (Midland, MI), Hagans; Patrick L. (Cleveland Heights, OH), Maxey; Lonnie C. (Powell, TN), Payzant; Edward A. (Oak Ridge, TN), Daniel; Claus (Knoxville, TN), Sabau; Adrian S. (Knoxville, TN), Dinwiddie; Ralph B. (Knoxville, TN), Armstrong; Beth L. (Oak Ridge, TN), Howe; Jane Y. (Oak Ridge, TN), Wood, III; David L. (Knoxville, TN), Nembhard; Nicole S. (Richmond, IN)
UT-Battelle, LLC (Oak Ridge, TN)
14/ 602,370
January 22, 2015
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH AND DEVELOPMENT This invention was made with government support under Contract No. DE-AC05-00OR22725 awarded by the U.S. Department of Energy. The government has certain rights in the invention.