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Mask alignment system for semiconductor processing

United States Patent

February 14, 2017
View the Complete Patent at the US Patent & Trademark Office
A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.
Webb; Aaron P. (Austin, TX), Carlson; Charles T. (Cedar Park, TX), Weaver; William T. (Austin, TX), Grant; Christopher N. (Dripping Springs, TX)
Varian Semiconductor Equipment Associates, Inc. (Gloucester, MA)
14/ 101,974
December 10, 2013
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT This Invention was made with U.S. Government support under Contract No. DE-EE0004737 awarded by the Department of Energy. The Government has certain rights in this invention.