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Ion implantation system and process for ultrasensitive determination of target isotopes

United States Patent

September 13, 2016
View the Complete Patent at the US Patent & Trademark Office
Pacific Northwest National Laboratory - Visit the Technology Commercialization Program Website
A system and process are disclosed for ultrasensitive determination of target isotopes of analytical interest in a sample. Target isotopes may be implanted in an implant area on a high-purity substrate to pre-concentrate the target isotopes free of contaminants. A known quantity of a tracer isotope may also be implanted. Target isotopes and tracer isotopes may be determined in a mass spectrometer. The present invention provides ultrasensitive determination of target isotopes in the sample.
Farmer, III; Orville T. (Kennewick, WA), Liezers; Martin (Richland, WA)
14/ 482,332
September 10, 2014
STATEMENT REGARDING RIGHTS TO INVENTION MADE UNDER FEDERALLY-SPONSORED RESEARCH AND DEVELOPMENT This invention was made with Government support under Contract DE-ACO5-76RLO1830 awarded by the U.S. Department of Energy. The Government has certain rights in the invention.