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Method and apparatus for wavefront sensing

United States Patent

August 23, 2016
View the Complete Patent at the US Patent & Trademark Office
A method of measuring characteristics of a wavefront of an incident beam includes obtaining an interferogram associated with the incident beam passing through a transmission mask and Fourier transforming the interferogram to provide a frequency domain interferogram. The method also includes selecting a subset of harmonics from the frequency domain interferogram, individually inverse Fourier transforming each of the subset of harmonics to provide a set of spatial domain harmonics, and extracting a phase profile from each of the set of spatial domain harmonics. The method further includes removing phase discontinuities in the phase profile, rotating the phase profile, and reconstructing a phase front of the wavefront of the incident beam.
Bahk; Seung-Whan (Rochester, NY)
14/ 587,392
December 31, 2014
STATEMENT AS TO RIGHTS TO INVENTIONS MADE UNDER FEDERALLY SPONSORED RESEARCH AND DEVELOPMENT This invention was made with Government support under Contract No. DE-FC52-08NA28302 awarded by the United States Department of Energy. The Government has certain rights in the invention.