Skip to Content
Find More Like This
Return to Search

Methods and apparatus for use with extreme ultraviolet light having contamination protection

United States Patent

July 12, 2016
View the Complete Patent at the US Patent & Trademark Office
Sandia National Laboratories - Visit the Intellectual Property Management and Licensing Website
An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.
Chilese; Francis C. (San Ramon, CA), Torczynski; John R. (Albuquerque, NM), Garcia; Rudy (Union City, CA), Klebanoff; Leonard E. (Dublin, CA), Delgado; Gildardo R. (Livermore, CA), Rader; Daniel J. (Albuquerque, NM), Geller; Anthony S. (Albuquerque, NM), Gallis; Michail A. (Albuquerque, NM)
KLA-Tencor Corporation (Milpitas, CA), Sandia Corporation (Albuquerque, NM)
14/ 176,587
February 10, 2014
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT This invention was developed with government support under Cooperative Research and Development Agreement No. SC11/01785.00 awarded by Sandia Corporation (a wholly-owned subsidiary of Lockheed Martin Corporation) as operator of Sandia National Laboratories under its U.S. Department of Energy Contract No. DE-AC04-94AL85000. The government has certain rights in the invention.