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Targets and processes for fabricating same

United States Patent

May 17, 2016
View the Complete Patent at the US Patent & Trademark Office
In particular embodiments, the present disclosure provides targets including a metal layer and defining a hollow inner surface. The hollow inner surface has an internal apex. The distance between at least two opposing points of the internal apex is less than about 15 .mu.m. In particular examples, the distance is less than about 1 .mu.m. Particular implementations of the targets are free standing. The targets have a number of disclosed shaped, including cones, pyramids, hemispheres, and capped structures. The present disclosure also provides arrays of such targets. Also provided are methods of forming targets, such as the disclosed targets, using lithographic techniques, such as photolithographic techniques. In particular examples, a target mold is formed from a silicon wafer and then one or more sides of the mold are coated with a target material, such as one or more metals.
Adams; Jesse D (Reno, NV), Malekos; Steven (Reno, NV), Le Galloudec; Nathalie (Livermore, CA), Korgan; Grant (Reno, NV), Cowan; Thomas (Dresden, DE), Sentoku; Yasuhiko (Reno, NV)
Board of Regents of the Nevada System of Higher Education, on behalf of the University of Nevada, Reno (Reno, NV)
13/ 839,973
March 15, 2013
GOVERNMENT SUPPORT This invention was made with government support under grant DE-FC52-01NV14050 awarded by the United States Department of Energy. The government has certain rights in the invention.