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Self-assembly of block copolymers on topographically patterned polymeric substrates

United States Patent

9,335,629
May 10, 2016
View the Complete Patent at the US Patent & Trademark Office
Lawrence Berkeley National Laboratory - Visit the Technology Transfer and Intellectual Property Management Department Website
Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.
Russell; Thomas P. (Amherst, MA), Park; Soojin (Ulsan, KR), Lee; Dong Hyun (Amherst, MA), Xu; Ting (Berkeley, CA)
THE UNIVERSITY OF MASSACHUSETTS (Boston, MA), THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (Oakland, CA)
13/ 546,378
20120276346
July 11, 2012
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH & DEVELOPMENT This invention was made with government support under Office of Basic Energy Sciences Grant No. DE-FG02-96ER45612 awarded by the Department of Energy; Office of Basic Energy Sciences Grant No. DE-AC02-05CH11231 awarded by the Department of Energy; and MRSEC Polymers Grant No. DMR-0213695 awarded by the National Science Foundation. The government has certain rights in the invention.