Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH & DEVELOPMENT
This invention was made with government support under Office of Basic Energy Sciences Grant No. DE-FG02-96ER45612 awarded by the Department of Energy; Office of Basic Energy Sciences Grant No. DE-AC02-05CH11231 awarded by the Department of Energy; and MRSEC Polymers Grant No. DMR-0213695 awarded by the National Science Foundation. The government has certain rights in the invention.