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Multiple complementary gas distribution assemblies

United States Patent

9,303,318
April 5, 2016
View the Complete Patent at the US Patent & Trademark Office
In one embodiment, an apparatus includes a first gas distribution assembly that includes a first gas passage for introducing a first process gas into a second gas passage that introduces the first process gas into a processing chamber and a second gas distribution assembly that includes a third gas passage for introducing a second process gas into a fourth gas passage that introduces the second process gas into the processing chamber. The first and second gas distribution assemblies are each adapted to be coupled to at least one chamber wall of the processing chamber. The first gas passage is shaped as a first ring positioned within the processing chamber above the second gas passage that is shaped as a second ring positioned within the processing chamber. The gas distribution assemblies may be designed to have complementary characteristic radial film growth rate profiles.
Ng; Tuoh-Bin (San Jose, CA), Melnik; Yuriy (San Jose, CA), Pang; Lily L (Fremont, CA), Tuncel; Eda (Menlo Park, CA), Chen; Lu (Cupertino, CA), Nguyen; Son T (San Jose, CA)
Applied Materials, Inc. (Santa Clara, CA)
13/ 649,488
20130098455
October 11, 2012
The United States Government has rights in this invention pursuant to Contract No. DE-EE0003331 between the United States Department of Energy and Applied Materials, Inc.