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Patterning by area selective oxidation

United States Patent

9,221,957
December 29, 2015
View the Complete Patent at the US Patent & Trademark Office
Brookhaven National Laboratory - Visit the Office of Technology Commercialization and Partnerships Website
Technologies are described for methods for producing a pattern of a material on a substrate. The methods may comprise receiving a patterned block copolymer on a substrate. The patterned block copolymer may include a first polymer block domain and a second polymer block domain. The method may comprise exposing the patterned block copolymer to a light effective to oxidize the first polymer block domain in the patterned block copolymer. The method may comprise applying a precursor to the block copolymer. The precursor may infuse into the oxidized first polymer block domain and generate the material. The method may comprise applying a removal agent to the block copolymer. The removal agent may be effective to remove the first polymer block domain and the second polymer block domain from the substrate, and may not be effective to remove the material in the oxidized first polymer block domain.
Nam; Chang-Yong (Coram, NY), Kamcev; Jovan (Austin, TX), Black; Charles T. (New York, NY), Grubbs; Robert (Miller Place, NY)
Brookhaven Science Associates, LLC (Upton, NY)
14/ 576,479
20150175761
December 19, 2014
The present application was made with Government support under contract number DE-AC02-98CH 10886 awarded by the U.S. Department of Energy. The United States government has certain rights in the invention(s).