Skip to Content
Find More Like This
Return to Search

Silicon nanocrystal inks, films, and methods

United States Patent

9,123,538
September 1, 2015
View the Complete Patent at the US Patent & Trademark Office
Los Alamos National Laboratory - Visit the Technology Transfer Division Website
Liquid-Phase Deposition of Silicon Nanocrystal Films
Silicon nanocrystal inks and films, and methods of making and using silicon nanocrystal inks and films, are disclosed herein. In certain embodiments the nanocrystal inks and films include halide-terminated (e.g., chloride-terminated) and/or halide and hydrogen-terminated nanocrystals of silicon or alloys thereof. Silicon nanocrystal inks and films can be used, for example, to prepare semiconductor devices.
Wheeler; Lance Michael (Minneapolis, MN), Kortshagen; Uwe Richard (Roseville, MN)
REGENTS OF THE UNIVERSITY OF MINNESOTA (Minneapolis, MN)
13/ 870,554
20130285007
April 25, 2013
GOVERNMENT FUNDING This invention was made with government support under CBET-0756326 awarded by the National Science Foundation and DE-AC52-06NA25396 awarded by the Department of Energy. The government has certain rights in the invention.