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Processing of insulators and semiconductors

United States Patent

9,059,079
June 16, 2015
View the Complete Patent at the US Patent & Trademark Office
Oak Ridge National Laboratory - Visit the Partnerships Directorate Website
A method is disclosed for processing an insulator material or a semiconductor material. The method includes pulsing a plasma lamp onto the material to diffuse a doping substance into the material, to activate the doping substance in the material or to metallize a large area region of the material. The method may further include pulsing a laser onto a selected region of the material to diffuse a doping substance into the material, to activate the doping substance in the material or to metallize a selected region of the material.
Quick; Nathaniel R (Lake Mary, FL), Joshi; Pooran C (Knoxville, TN), Duty; Chad Edward (Knoxville, TN), Jellison, Jr.; Gerald Earle (Oak Ridge, TN), Angelini; Joseph Attilio (Henderson, TN)
UT-Battelle, LLC (Oak Ridge, TN), APPLICOTE, LLC (Lake Mary, FL)
14/ 036,925
September 25, 2013
This invention was made with government support under Contract No. DE-AC05-00OR22725 awarded by the U.S. Department of Energy. The government has certain rights in the invention.