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Ion beam sputter target and method of manufacture

United States Patent

September 2, 2014
View the Complete Patent at the US Patent & Trademark Office
A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.
Higdon; Clifton (Birmingham, MI), Elmoursi; Alaa A. (Troy, MI), Goldsmith; Jason (Meadville, PA), Cook; Bruce (Ankeny, IA), Blau; Peter (Knoxville, TN), Jun; Qu (Knoxville, TN), Milner; Robert (Warren, MI)
12/ 792,324
June 2, 2010
GRANT INFORMATION The invention described herein was made in the course of research under Department of Energy Grant No. DE-FG36-06GO16054. The federal government may have certain rights in the invention.