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Processing of monolayer materials via interfacial reactions

United States Patent

May 20, 2014
View the Complete Patent at the US Patent & Trademark Office
Brookhaven National Laboratory - Visit the Office of Technology Commercialization and Partnerships Website
A method of forming and processing of graphene is disclosed based on exposure and selective intercalation of the partially graphene-covered metal substrate with atomic or molecular intercalation species such as oxygen (O.sub.2) and nitrogen oxide (NO.sub.2). The process of intercalation lifts the strong metal-carbon coupling and restores the characteristic Dirac behavior of isolated monolayer graphene. The interface of graphene with metals or metal-decorated substrates also provides for controlled chemical reactions based on novel functionality of the confined space between a metal surface and a graphene sheet.
Sutter; Peter Werner (Westhampton Beach, NY), Sutter; Eli Anguelova (Westhampton Beach, NY)
Brookhaven Science Associates, LLC (Upton, NY)
13/ 468,592
May 10, 2012
STATEMENT OF GOVERNMENT LICENSE RIGHTS This invention was made with Government support under contract number DE-AC02-98CH10886, awarded by the U.S. Department of Energy. The Government has certain rights in the invention.